XRD studies of thermally stable mesoporous tungsten oxide synthesised by a templated sol-gel process from tungstic acid precursor

Hdl Handle:
http://hdl.handle.net/10149/91334
Title:
XRD studies of thermally stable mesoporous tungsten oxide synthesised by a templated sol-gel process from tungstic acid precursor
Authors:
Wang, W. (Wei); Pang, Y. X. (Yongxin); Hodgson, S. N. B. (Simon)
Affiliation:
University of Teesside. School of Science and Technology.
Citation:
Wang, W., Pang, Y. X. and Hodgson, S. N. B. (2009) 'XRD studies of thermally stable mesoporous tungsten oxide synthesised by a templated sol-gel process from tungstic acid precursor', Microporous and Mesoporous Materials, 121 (2-3), pp.121-128.
Publisher:
Elsevier
Journal:
Microporous and Mesoporous Materials
Issue Date:
May-2009
URI:
http://hdl.handle.net/10149/91334
DOI:
10.1016/j.micromeso.2009.01.014
Abstract:
Thermally stable mesoporous tungsten oxide film was prepared by a surfactant templated sol-gel method using tungstic acid as tungsten source. By careful selection of suitable non-ionic surfactant and heating processes, thermally stable mesostructured tungsten oxide films can be obtained, capable of withstanding heat treatment at temperatures of more than 400 oC. The results show that tungstic acid is a suitable alternative precursor to the tungsten hexachloride normally reported in the literature for the preparation of mesostructured tungsten oxide. This work opens a new pathway for the preparation of mesoporous tungsten oxide films using tungstic acid precursor with many advantages including reduced cost, easy handling, and insensitivity to moisture.
Type:
Article
Language:
en
Keywords:
mesoporous; tungsten oxide; tungstic acid; sol-gel process
ISSN:
1387-1811
Rights:
Author can archive post-print (ie final draft post-refereeing). For full details see http://www.sherpa.ac.uk/romeo/ [Accessed 08/02/2010]
Citation Count:
1 [Scopus, 08/02/2010]

Full metadata record

DC FieldValue Language
dc.contributor.authorWang, W. (Wei)en
dc.contributor.authorPang, Y. X. (Yongxin)en
dc.contributor.authorHodgson, S. N. B. (Simon)en
dc.date.accessioned2010-02-08T09:49:13Z-
dc.date.available2010-02-08T09:49:13Z-
dc.date.issued2009-05-
dc.identifier.citationMicroporous and Mesoporous Materials; 121(2-3): 121-128en
dc.identifier.issn1387-1811-
dc.identifier.doi10.1016/j.micromeso.2009.01.014-
dc.identifier.urihttp://hdl.handle.net/10149/91334-
dc.description.abstractThermally stable mesoporous tungsten oxide film was prepared by a surfactant templated sol-gel method using tungstic acid as tungsten source. By careful selection of suitable non-ionic surfactant and heating processes, thermally stable mesostructured tungsten oxide films can be obtained, capable of withstanding heat treatment at temperatures of more than 400 oC. The results show that tungstic acid is a suitable alternative precursor to the tungsten hexachloride normally reported in the literature for the preparation of mesostructured tungsten oxide. This work opens a new pathway for the preparation of mesoporous tungsten oxide films using tungstic acid precursor with many advantages including reduced cost, easy handling, and insensitivity to moisture.en
dc.language.isoenen
dc.publisherElsevieren
dc.rightsAuthor can archive post-print (ie final draft post-refereeing). For full details see http://www.sherpa.ac.uk/romeo/ [Accessed 08/02/2010]en
dc.subjectmesoporousen
dc.subjecttungsten oxideen
dc.subjecttungstic aciden
dc.subjectsol-gel processen
dc.titleXRD studies of thermally stable mesoporous tungsten oxide synthesised by a templated sol-gel process from tungstic acid precursoren
dc.typeArticleen
dc.contributor.departmentUniversity of Teesside. School of Science and Technology.en
dc.identifier.journalMicroporous and Mesoporous Materialsen
ref.citationcount1 [Scopus, 08/02/2010]en
or.citation.harvardWang, W., Pang, Y. X. and Hodgson, S. N. B. (2009) 'XRD studies of thermally stable mesoporous tungsten oxide synthesised by a templated sol-gel process from tungstic acid precursor', Microporous and Mesoporous Materials, 121 (2-3), pp.121-128.-
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