DC magnetron sputter deposited vanadia catalysts for oxidation processes

Hdl Handle:
http://hdl.handle.net/10149/112782
Title:
DC magnetron sputter deposited vanadia catalysts for oxidation processes
Authors:
Olea, M. (Maria); Sack, I. (Isabelle); Balcaen, V. (Veerle); Marin, G. B. (Guy); Poelman, H. (Hilde); Eufinger, K. (Karin); Poelman, D. (Dirk); de Gryse, R. (Roger); Paul, J. S.; Sels, B. F. E. (Bert)
Affiliation:
Ghent University. Department of Chemical Engineering. Laboratorium voor Petrochemische Techniek.
Citation:
Olea, M. et. al. (2007) 'DC magnetron sputter deposited vanadia catalysts for oxidation processes', Applied Catalysis A: General, 318, pp.37-44.
Publisher:
Elsevier
Journal:
Applied Catalysis A: General
Issue Date:
20-Feb-2007
URI:
http://hdl.handle.net/10149/112782
DOI:
10.1016/j.apcata.2006.10.035
Additional Links:
http://linkinghub.elsevier.com/retrieve/pii/S0926860X06007721
Type:
Article
Language:
en
Keywords:
DC magnetron sputtering; ICP; isobutane; oxidative dehydrogenation; propane; steady-state experiments; TAP; transient experiments; vanadia-based catalysts; XPS
ISSN:
0926-860X
Rights:
Author can archive post-print (ie final draft post-refereeing). For full details see http://www.sherpa.ac.uk/romeo/ [Accessed 11/10/2010]
Citation Count:
5 [Scopus, 11/10/2010]

Full metadata record

DC FieldValue Language
dc.contributor.authorOlea, M. (Maria)en
dc.contributor.authorSack, I. (Isabelle)en
dc.contributor.authorBalcaen, V. (Veerle)en
dc.contributor.authorMarin, G. B. (Guy)en
dc.contributor.authorPoelman, H. (Hilde)en
dc.contributor.authorEufinger, K. (Karin)en
dc.contributor.authorPoelman, D. (Dirk)en
dc.contributor.authorde Gryse, R. (Roger)en
dc.contributor.authorPaul, J. S.en
dc.contributor.authorSels, B. F. E. (Bert)en
dc.date.accessioned2010-10-11T15:15:40Z-
dc.date.available2010-10-11T15:15:40Z-
dc.date.issued2007-02-20-
dc.identifier.citationApplied Catalysis A: General; 318: 37-44en
dc.identifier.issn0926-860X-
dc.identifier.doi10.1016/j.apcata.2006.10.035-
dc.identifier.urihttp://hdl.handle.net/10149/112782-
dc.language.isoenen
dc.publisherElsevieren
dc.relation.urlhttp://linkinghub.elsevier.com/retrieve/pii/S0926860X06007721en
dc.rightsAuthor can archive post-print (ie final draft post-refereeing). For full details see http://www.sherpa.ac.uk/romeo/ [Accessed 11/10/2010]en
dc.subjectDC magnetron sputteringen
dc.subjectICPen
dc.subjectisobutaneen
dc.subjectoxidative dehydrogenationen
dc.subjectpropaneen
dc.subjectsteady-state experimentsen
dc.subjectTAPen
dc.subjecttransient experimentsen
dc.subjectvanadia-based catalystsen
dc.subjectXPSen
dc.titleDC magnetron sputter deposited vanadia catalysts for oxidation processesen
dc.typeArticleen
dc.contributor.departmentGhent University. Department of Chemical Engineering. Laboratorium voor Petrochemische Techniek.en
dc.identifier.journalApplied Catalysis A: Generalen
ref.citationcount5 [Scopus, 11/10/2010]en
or.citation.harvardOlea, M. et. al. (2007) 'DC magnetron sputter deposited vanadia catalysts for oxidation processes', Applied Catalysis A: General, 318, pp.37-44.-
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