Optimization of Neon SXR (soft x-ray) yield of the INTI Plasma Focus Machine at 12 kV

Hdl Handle:
http://hdl.handle.net/10149/565789
Title:
Optimization of Neon SXR (soft x-ray) yield of the INTI Plasma Focus Machine at 12 kV
Authors:
Roy, F. (Federico); Chong, P. L. (Perk Lin); Saw, S. H.
Affiliation:
Teesside University. School of Science and Engineering
Citation:
Frederico, A. R. J. A., Chong, P. L., Saw, S. H. (2015) 'Optimization of Neon SXR (soft x-ray) yield of the INTI Plasma Focus Machine at 12 kV' Journal of Engineering Science and Technology; 10 (2): 184-195
Publisher:
Taylors Univeristy
Journal:
Journal of Engineering Science and Technology
Issue Date:
Feb-2015
URI:
http://hdl.handle.net/10149/565789
Additional Links:
http://jestec.taylors.edu.my/V10Issue2.htm
Abstract:
The INTI plasma focus machine is a 3 kJ Mather type plasma focus machine,powered by a single Maxwell capacitor. The system produces remarkable consistent focusing action in neon, making it a suitable source for the production of high energy photons, electrons, ions and neon soft x-rays (SXR) [1, 2]. The aim of this paper is to optimise the neon SXR yield of the INTI plasma focus machine operated at 12 kV by parametrically, changing the anode dimensions (radius and length) using the Lee Model Code (version RADPFV5.15dd). Results of the optimisation procedures resulted in a neon SXR yield of 6.47 J at 2.5 torr and 12 kV, with a shorter length and a fatter anode radius of 7.9 cm and 1.2 cm respectively. This gives an improvement in the neon SXR yield of 40% when compares to neon SXR yield of 2.74 J at 2.5 torr 12 kV with the present configurations.
Type:
Article
Language:
en
Keywords:
INTI PF; Neon SXR Yield; Lee model code
Rights:
No publisher policy information available from http://www.sherpa.ac.uk/romeo. JESTEC is available for free online For full details see: http://jestec.taylors.edu.my/instructions.html [Accessed: 11/08/2015]

Full metadata record

DC FieldValue Language
dc.contributor.authorRoy, F. (Federico)en
dc.contributor.authorChong, P. L. (Perk Lin)en
dc.contributor.authorSaw, S. H.en
dc.date.accessioned2015-08-11T09:04:55Zen
dc.date.available2015-08-11T09:04:55Zen
dc.date.issued2015-02en
dc.identifier.citationJournal of Engineering Science and Technology; 10 (2): 184-195en
dc.identifier.urihttp://hdl.handle.net/10149/565789en
dc.description.abstractThe INTI plasma focus machine is a 3 kJ Mather type plasma focus machine,powered by a single Maxwell capacitor. The system produces remarkable consistent focusing action in neon, making it a suitable source for the production of high energy photons, electrons, ions and neon soft x-rays (SXR) [1, 2]. The aim of this paper is to optimise the neon SXR yield of the INTI plasma focus machine operated at 12 kV by parametrically, changing the anode dimensions (radius and length) using the Lee Model Code (version RADPFV5.15dd). Results of the optimisation procedures resulted in a neon SXR yield of 6.47 J at 2.5 torr and 12 kV, with a shorter length and a fatter anode radius of 7.9 cm and 1.2 cm respectively. This gives an improvement in the neon SXR yield of 40% when compares to neon SXR yield of 2.74 J at 2.5 torr 12 kV with the present configurations.en
dc.language.isoenen
dc.publisherTaylors Univeristyen
dc.relation.urlhttp://jestec.taylors.edu.my/V10Issue2.htmen
dc.rightsNo publisher policy information available from http://www.sherpa.ac.uk/romeo. JESTEC is available for free online For full details see: http://jestec.taylors.edu.my/instructions.html [Accessed: 11/08/2015]en
dc.subjectINTI PFen
dc.subjectNeon SXR Yielden
dc.subjectLee model codeen
dc.titleOptimization of Neon SXR (soft x-ray) yield of the INTI Plasma Focus Machine at 12 kVen
dc.typeArticleen
dc.contributor.departmentTeesside University. School of Science and Engineeringen
dc.identifier.journalJournal of Engineering Science and Technologyen
or.citation.harvardFrederico, A. R. J. A., Chong, P. L., Saw, S. H. (2015) 'Optimization of Neon SXR (soft x-ray) yield of the INTI Plasma Focus Machine at 12 kV' Journal of Engineering Science and Technology; 10 (2): 184-195en
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