A 160 kJ dual plasma focus (DuPF) for fusion-relevant materials testing and nano-materials fabrication

Hdl Handle:
http://hdl.handle.net/10149/565791
Title:
A 160 kJ dual plasma focus (DuPF) for fusion-relevant materials testing and nano-materials fabrication
Authors:
Saw, S. H.; Damideh, V.; Chong, P. L. (Perk Lin); Lee, P.; Rawat, R. S.; Lee, S.
Affiliation:
Teesside University. School of Science and Engineering
Publisher:
World Scientific Publishing
Journal:
International Journal of Modern Physics: Conference Series
Issue Date:
Jan-2014
URI:
http://hdl.handle.net/10149/565791
DOI:
10.1142/S2010194514603226
Additional Links:
http://www.worldscientific.com/doi/abs/10.1142/S2010194514603226
Abstract:
This paper summarizes PF-160 Dual Plasma Focus (DuPF) numerical experiments using the Lee Model code and preliminary 3D design drawings using SolidWorks software. This DuPF consists of two interchangeable electrodes enabling it to be optimized for both Slow Pinch Mode (SFM) and Fast Pinch Mode (FFM); the latter using a speed factor (SF) of 90 kA cm-1 Torr-0.5 for FFM in deuterium [S Lee et al, IEEE Trans Plasma Science 24, 1101-1105 (1996)]; and the former with SF of less than half that value for SFM. Starting with available 6 x 450 μF capacitors rated at 11kV (10% reversal), numerical experiments indicate safe operation at 9 kV, 6 Torr deuterium with FFM anode of 5 cm radius; producing intense ion beam and streaming plasma pulses which would be useful for studies of potential fusion reactor wall materials. On the other hand operating at 5 kV, 10 Torr deuterium with SFM anode of 10 cm radius leads to long- duration, uniform large-area flow which could be more suitable for synthesis of nano-materials. The dual plasma focus design is illustrated here with two figures showing FFM and SFM electrodes.
Type:
Article
ISSN:
2010-1945; 2010-1945
Rights:
This is an Open Access article published by World Scientific Publishing Company. It is distributed under the terms of the Creative Commons Attribution 3.0 (CC-BY) License. For full details see: https://creativecommons.org/licenses/by/3.0/ [Accessed: 11/08/2015]

Full metadata record

DC FieldValue Language
dc.contributor.authorSaw, S. H.en
dc.contributor.authorDamideh, V.en
dc.contributor.authorChong, P. L. (Perk Lin)en
dc.contributor.authorLee, P.en
dc.contributor.authorRawat, R. S.en
dc.contributor.authorLee, S.en
dc.date.accessioned2015-08-11T09:17:27Zen
dc.date.available2015-08-11T09:17:27Zen
dc.date.issued2014-01en
dc.identifier.citationInternational Journal of Modern Physics: Conference Series; 32:1460322en
dc.identifier.issn2010-1945en
dc.identifier.issn2010-1945en
dc.identifier.doi10.1142/S2010194514603226en
dc.identifier.urihttp://hdl.handle.net/10149/565791en
dc.description.abstractThis paper summarizes PF-160 Dual Plasma Focus (DuPF) numerical experiments using the Lee Model code and preliminary 3D design drawings using SolidWorks software. This DuPF consists of two interchangeable electrodes enabling it to be optimized for both Slow Pinch Mode (SFM) and Fast Pinch Mode (FFM); the latter using a speed factor (SF) of 90 kA cm-1 Torr-0.5 for FFM in deuterium [S Lee et al, IEEE Trans Plasma Science 24, 1101-1105 (1996)]; and the former with SF of less than half that value for SFM. Starting with available 6 x 450 μF capacitors rated at 11kV (10% reversal), numerical experiments indicate safe operation at 9 kV, 6 Torr deuterium with FFM anode of 5 cm radius; producing intense ion beam and streaming plasma pulses which would be useful for studies of potential fusion reactor wall materials. On the other hand operating at 5 kV, 10 Torr deuterium with SFM anode of 10 cm radius leads to long- duration, uniform large-area flow which could be more suitable for synthesis of nano-materials. The dual plasma focus design is illustrated here with two figures showing FFM and SFM electrodes.en
dc.publisherWorld Scientific Publishingen
dc.relation.urlhttp://www.worldscientific.com/doi/abs/10.1142/S2010194514603226en
dc.rightsThis is an Open Access article published by World Scientific Publishing Company. It is distributed under the terms of the Creative Commons Attribution 3.0 (CC-BY) License. For full details see: https://creativecommons.org/licenses/by/3.0/ [Accessed: 11/08/2015]en
dc.titleA 160 kJ dual plasma focus (DuPF) for fusion-relevant materials testing and nano-materials fabricationen
dc.typeArticleen
dc.contributor.departmentTeesside University. School of Science and Engineeringen
dc.identifier.journalInternational Journal of Modern Physics: Conference Seriesen
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