DC magnetron sputtered vanadia catalysts for oxidation processes

Hdl Handle:
http://hdl.handle.net/10149/98827
Title:
DC magnetron sputtered vanadia catalysts for oxidation processes
Book Title:
ACS National Meeting Book of Abstracts
Authors:
Olea, M. (Maria); Sack, I. (Isabelle); Balcaen, V. (Veerle); Marin, G. B. (Guy); Poelman, H. (Hilde); Eufinger, K. (Karin); de Gryse, R. (Roger); Paul, J. S.; Sels, B. F. E. (Bert); Jacobs, P. A. (Peter)
Affiliation:
Ghent University. Department of Chemical Engineering. Laboratorium voor Petrochemische Techniek. Belgium; Catholic University of Louvain. Unité de catalyse et chimie des matériaux divisés. Belgium.
Citation:
Olea, M. et. al. (2004) 'DC magnetron sputtered vanadia catalysts for oxidation processes', 228th ACS National meeting, Philadelphia, August 22 - 26, in ACS National Meeting Book of Abstracts. American Chemical Society.
Publisher:
American Chemical Society
Conference:
228th ACS National meeting, Philadelphia, August 22 - 26, 2004
Issue Date:
2004
URI:
http://hdl.handle.net/10149/98827
Abstract:
To deposit highly adhesive thin films, DC magnetron sputtering method was chosen and two series of supported vanadia catalysts were prepared, i.e., direct deposition of vanadia onto a ZrO2/SiO2 carrier; b) deposition of vanadia onto a TiO2 layer that was sputtered first onto carrier. A kinetic model for the reduction/reoxidation of the catalysts was proposed and kinetic parameters were estimated by regression of single-pulse responses obtained in a Temporal Analysis of Products setup. The catalytic performances for the oxidative dehydrogenation of isobutane were studied. Preparation conditions, e.g., intermediate heating between two depositions, final heating after vanadia deposition, temperature of the final heating, and deposition time of the vanadia layer strongly influenced the physical properties of these catalysts, which, in turn had a strong influence on their chemical behavior. This is an abstract of a paper presented at the 228th ACS National Meeting (Philadelphia, PA 8/22-26/2004).
Type:
Meetings and Proceedings; Book Chapter
Language:
en
Keywords:
DC magnetron sputtering; vanadia catalysts; temporal analysis of products; TAP
Series/Report no.:
228 (1)
ISSN:
0065-7727
Citation Count:
0 [Scopus, 14/05/2010]

Full metadata record

DC FieldValue Language
dc.contributor.authorOlea, M. (Maria)en
dc.contributor.authorSack, I. (Isabelle)en
dc.contributor.authorBalcaen, V. (Veerle)en
dc.contributor.authorMarin, G. B. (Guy)en
dc.contributor.authorPoelman, H. (Hilde)en
dc.contributor.authorEufinger, K. (Karin)en
dc.contributor.authorde Gryse, R. (Roger)en
dc.contributor.authorPaul, J. S.en
dc.contributor.authorSels, B. F. E. (Bert)en
dc.contributor.authorJacobs, P. A. (Peter)en
dc.date.accessioned2010-05-14T15:24:40Z-
dc.date.available2010-05-14T15:24:40Z-
dc.date.issued2004-
dc.identifier.issn0065-7727-
dc.identifier.urihttp://hdl.handle.net/10149/98827-
dc.description.abstractTo deposit highly adhesive thin films, DC magnetron sputtering method was chosen and two series of supported vanadia catalysts were prepared, i.e., direct deposition of vanadia onto a ZrO2/SiO2 carrier; b) deposition of vanadia onto a TiO2 layer that was sputtered first onto carrier. A kinetic model for the reduction/reoxidation of the catalysts was proposed and kinetic parameters were estimated by regression of single-pulse responses obtained in a Temporal Analysis of Products setup. The catalytic performances for the oxidative dehydrogenation of isobutane were studied. Preparation conditions, e.g., intermediate heating between two depositions, final heating after vanadia deposition, temperature of the final heating, and deposition time of the vanadia layer strongly influenced the physical properties of these catalysts, which, in turn had a strong influence on their chemical behavior. This is an abstract of a paper presented at the 228th ACS National Meeting (Philadelphia, PA 8/22-26/2004).en
dc.language.isoenen
dc.publisherAmerican Chemical Societyen
dc.relation.ispartofseries228 (1)en
dc.subjectDC magnetron sputteringen
dc.subjectvanadia catalystsen
dc.subjecttemporal analysis of productsen
dc.subjectTAPen
dc.titleDC magnetron sputtered vanadia catalysts for oxidation processesen
dc.typeMeetings and Proceedingsen
dc.typeBook Chapteren
dc.contributor.departmentGhent University. Department of Chemical Engineering. Laboratorium voor Petrochemische Techniek. Belgium; Catholic University of Louvain. Unité de catalyse et chimie des matériaux divisés. Belgium.en
dc.title.bookACS National Meeting Book of Abstractsen
dc.identifier.conference228th ACS National meeting, Philadelphia, August 22 - 26, 2004en
ref.citationcount0 [Scopus, 14/05/2010]en
or.citation.harvardOlea, M. et. al. (2004) 'DC magnetron sputtered vanadia catalysts for oxidation processes', 228th ACS National meeting, Philadelphia, August 22 - 26, in ACS National Meeting Book of Abstracts. American Chemical Society.-
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